HS: Polyethylene film, of a thickness of 20 micrometres or more but not ex

Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

Noncellular polyethylene film of a thickness of > 20 micrometres but < 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits

HS code : 392010 GN code : 39201023 Taric code : 392010230080

Less than 0,94

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HS code 392010

Polyethylene film, of a thickness of 20 micrometres or more but not exceeding 40 micrometres, for the production of photoresist film used in the manufacture of semiconductors or printed circuits